Carl Zeiss SMT Exhibits at 2005 Semicon Europa
17 March 2005 16:38
Carl Zeiss SMT will be exhibiting at the major European semiconductor trade show Semicon Europa, 12 to 14 April 2005 in Munich, Germany.
The Semiconductor Metrology Systems Division will present two product lines: AIMS mask qualification tools and MeRiT advanced mask repair tools.
The unique AIMS™ family of Mask qualification tools which are used in mask shops around the globe. AIMS™ mask qualification is extremely time effective, no printing needed, and contributes significantly to yield enhancement. With new tools AIMS is now available for mask qualification directly in the fab to qualify the masks before defects causes substantial damages to production.
The MeRiT™ MG E-Beam based mask repair tool now enables repair of mask features as small as 45nm and beyond without causing any adverse effects on the quartz substrate. After initial tests by the industry, the tool is now accepted as the instrument of choice for next generation mask repair tools.
The Nano Technology Systems Division presents the award-winning CrossBeam 3D analysis FIB tool and the unique GEMINI FESEM failure analysis tool. Both tools enable extremely high resolution imaging and analysis to detect small defects.
Also presented will be the MII range of S-FIL nano imprint tools which enable printing features down to 20nm with a wafer throughput up to 5wfs/h. Please stop by to inform yourself about the latest Imprio 250 tool - a real production tool.
For more information on this company:
Carl Zeiss SMT - Mask Qualification and Repair, Failure Analysis and Nano Imprint Photography Tools
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