Advanced Converters - Vacuum Plasma Power Supplies for Sputtering, Bias and Arc ApplicationsAdvanced Converters' (AC) vacuum plasma power supply designs are based on a long experience (since 1986) in vacuum plasma power systems. The development of applications such as magnetron (sputter), bias or arc has been accompanied by the development of a new generation of power supplies. The actual standard vacuum plasma power supplies incorporate state-of-the-art power electronic technologies like DSP (Digital Signal Processor) control, adaptive regulation algorithms, FPGA (Field Programmable Gate Array) based arc management and ultra-high-frequency power conversion. The newest vacuum plasma technology does not compromise on reliability - the actual generation has proved its advantages since 1999. It is designed in accordance to VDE and IEC standards and is able to fulfil the requirements of standard CE. Production is ISO 9001 certified, assuring high quality of all products. HIGH-QUALITY VACUUM PLASMA POWER SUPPLIES AND ISO 9001 CERTIFIED PLASMA GENERATORSAC power supplies, whether serial or customised, always comply with the standard which has been work out and settled in the company. Our standard means:
The plasma generators are manufactured in conformance with the ISO 9001 quality system certified by DNV. Design and production are strictly monitored to assure the highest quality. This quality is confirmed by a full 3yr warrantee, including labour and components. AC power supplies are CE-compliant which meet requirements:
POWER SUPPLIES FOR SPUTTERINGThe MP and PMP power supplies are intended for hard use in industrial vacuum plasma processes. Their ability to deliver maximum power to wide-load impedance range has been optimised for sputtering applications. Nevertheless, other DC or pulsed applications will also be correctly supplied. Parameters of the regulation and arc suppression subsystems are optimised for sufficient management of different processes - from semiconductor to hard-coat applications. Most commonly, the output voltage varies from 400V to 800V at full power, but other voltages are possible at the time of order. POWER SUPPLIES FOR BIASThe BP and PBP power supplies are intended for hard use in industrial vacuum plasma processes. Two operation modes, the High Voltage Mode (HVM) and the Low Voltage Mode (LVM), have been optimised for bias applications. Nevertheless, other DC or pulsed applications will also be correctly supplied. Parameters of the regulation and arc suppression subsystems are optimised for sufficient management of different process stages like etching, glowing or coating. Most commonly, the HV Mode is used for pre-treatment (etching, glowing, etc.) with voltages up to 1,200V and lower current requirements. The LV Mode is commonly used for coating with voltages in the range of 0V to 300V with higher current demands. POWER SUPPLIES FOR ARC CATHODESThe ARM power supplies are intended for hard use in industrial vacuum plasma processes. The supplies' high dynamic current regulator has been optimised for arc cathodes applications. Nevertheless, other DC applications with equivalent power requirements will be supplied. Parameters of the regulation subsystems are optimised for sufficient management of different processes in hard-coat applications. CUSTOMISED CONFIGURATIONSystem integrators may require additional features in special configurations, such as:
These and other customized solutions are offered by Advanced Converters® to optimally supply the vacuum plasma with power. MODERN POWER SUPPLY SOLUTIONS USING VACUUM PLASMA TECHNOLOGIESOur advanced converters are used worldwide, from USA to Brazil, from Japan to Taiwan, from Germany to Switzerland. This world experience helps us to satisfy all customers' requirements into detail. Close observation of the market and scientific developments in vacuum plasma technologies helps us serve customers with the most modern power supply solutions. Furthermore, thanks to the active participation in serious research projects in close co-operation with world-leading system builders, AC has become a renowned high-tech company. Undoubtedly this leading position is mainly thanks to our highly qualified and experienced engineers team with one professor, five doctors and 22 engineer specialists in power electronics, who are always ready to develop new advanced power supplies to suit unique customer requirements. They are ready to realise all your power dreams.
AC Sp. z o.o.
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![]() Advanced Converters' (AC) vacuum plasma power supply designs are based on a long experience (since 1986) in vacuum plasma power systems. | ||
![]() The MP and PMP power supplies are intended for hard use in industrial vacuum plasma processes. | |||
![]() Thanks to the active participation in serious research projects in close co-operation with world-leading system builders, AC has become a renowned high-tech company. | |||
![]() The development of applications such as magnetron (sputter), bias or arc has been accompanied by the development of a new generation of vacuum plasma power supplies. | |||
![]() Close observation of the market and scientific developments in vacuum plasma technologies helps us serve customers with the most modern power supply solutions. |
