Aurion - Plasma Surface TreatmentAurion Anlagentechnik GmbH specializes in surface treatment components and systems. Headquartered in Seligenstadt near Frankfurt, Germany, Aurion was founded in 1996 in order to produce components and complete systems for plasma surface treatment in R&D and production that are efficient, cost reducing and ecologically desirable. COMPONENTS FOR PLASMA SYSTEM POWER SUPPLYAurion develops and manufactures components for the power supply of plasma systems. Components manufactured by Aurion include:
The activities in this field are mainly focused on RF plasma processes with 13.56MHz and 27.12MHz. Aurion offers individual high quality tailored solutions, designed to meet the exacting requirement of our customers. For this reason Aurion is continually delivering key components for large equipment manufacturers to very high specification. VACUUM SYSTEMS FOR PLASMA ASSISTED SURFACESBased on the know-how from manufacturing components for plasma processes, Aurion is able to offer complete vacuum systems for plasma assisted surface treatment. This includes surface cleaning and surface modification as well as coating and etching (PVD, PECVD, RIE, Microwave downstream). A very flexible modular concept for plasma systems ensures tailor-made solutions meeting customersī specific needs.COATING AND REACTIVE ION ETCHINGAurion systems are used in semiconductor and microsystem technology, where they can be used for coating and reactive ion etching (e.g. photo resist ashing, contact cleaning). Further applications include fine cleaning of metal or glass and the pre-treatment of polymer surfaces in order to improve the adherence for example. Aurion's standard products include the KIVOS series for PVD, PECVD and RIE processes, the CYLOS for circular substrates and the PIKNOS 30 MW microwave machine. Aurion also provides custom made systems. PLASMA AND RF TECHNOLOGY SERVICESAurion experts also offer consulting services and training courses in plasma and RF technology, as well as in analytics and EMC measurement.
Aurion Anlagentechnik GmbH
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![]() KIVOS 750 RIE, equipped with five drawers (electrodes) for high loading capacity. | ||
![]() PIKNOS 30 MW, Aurionīs microwave downstream plasma system. | |||
![]() Circular electrode of the CYLOS RIE system. | |||
![]() Matchbox PRODIK-T 160 for 160 Amps output current. |
