Vistec Electron Beam - Electron-Beam Lithography Systems

Vistec Electron Beam is a worldwide-renowned company which develops, manufactures, sells and services electron-beam lithography systems, mainly for the semiconductor industry. Besides semiconductor industry applications, customers focusing on optics and applied research are served too.

Electron-beam lithography has long been established as a valuable technology, both in research and science, and in the mask-making business. In the past five years, electron-beam lithography has also been put to industrial use as a direct-write technology for Si-based production. This is where Vistec Electron Beam currently holds a leading position in the market.

Vistec Electron Beam has a proven record of experience and expertise in developing and manufacturing electron-beam lithography systems for the semiconductor industry. The company has its roots in the famous manufacturer Carl Zeiss Jena, a world-leading organisation in high-precision optical instruments.

INNOVATIVE ELECTRON-BEAM LITHOGRAPHY TECHNIQUES

The company, which is located in Jena, Germany, benefits from its partnership with the local Friedrich Schiller University. Vistec Electron Beam also has links with the Fraunhofer Institutes and many other organizations, including small and mid-size companies in the Jena region.

Over the years, the close relationships developed with these partners have been a key factor in the company’s success. Through these relationships with both developers and manufacturers, Vistec Electron Beam is able to offer its customers the best and most innovative techniques and equipment for electron-beam lithography.

The first variable-shaped beam system was launched in the early 1970s. Since then, a team of highly-motivated employees, excellent researchers and high-quality engineers has constantly worked to ensure the outstanding performance of our electron-beam lithography systems, thus fulfilling customer requirements.

VISTEC SB3050 ELECTRON-BEAM LITHOGRAPHY SYSTEM

The Vistec SB3050 series electron-beam lithography system is designed to meet the challenges of direct-write patterning for research and development. Prototyping to the 32mm technology node and below, it features variable-shaped beam technology and continuously moving stage principles for throughput optimization.

The industrially-proven 300mm design has been successfully used in more than ten installations worldwide and ensures full 300mm wafer-exposure capability.

A new 50kV electron-optical column guarantees excellent resolution. Thanks to the graphical user interface the Vistec SB3050 can be easily integrated into automated production environments (CIM).

Capable of exposing both masks (including templates) and wafers, the Vistec SB3050 exposure tool is the ideal bridge to next-generation technology nodes.

VISTEC SB250 ELECTRON-BEAM LITHOGRAPHY WRITER

Vistec SB250 series electron-beam lithography writers are designed as universal and cost-effective tools for both direct-write and mask-making applications, and allow customers to react flexibly to market demands. With its 210mm² stage travel range, the Vistec SB250 series electron-beam lithography writer is the ideal tool for exposing masks up to 7in and wafers up to 200mm in diameter.

Thanks to its modular-system architecture, the SB250 can be easily upgraded to a higher level of performance. The small cleanroom footprint and the fully automatic substrate handling, as well as the state-of-the-art operating and data-preparation software, are additional features of the SB250 system which are offered to customers from the industry and applied research sector.