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Sensitivity and Performance Estimates for the Multiple Wavelength, Multiple Incidence Angle Ellipsometry for OCD Applications

17 February 2012

New complex transistors architectures expand application space of the scatterometry beyond measurements of the simple photoresist and a-Si gratings towards characterisation of more complex structures.

It has been suggested that in order to achieve that, scatterometry measurements would have to expand beyond the single angle spectroscopic ellipsometry (SE) to include data collected at multiple incidence angles, or sample orientations.

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  • Sensitivity and Performance Estimates for the Multiple Wavelength, Multiple Incidence Angle Ellipsometry for OCD Applications
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