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Optimisation Solvers in Run-to-Run Control

17 February 2012

Semiconductor manufacturing processes with multiple settings or multiple targets, such as furnace applications or processes controlling uniformity, may not have a single algebraic solution, in which case optimisation methods are required.

While there are many optimisation algorithms available, most are not guaranteed to find the global optimum, take longer than an analytic solution, and produce a less precise result.

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