Immersion Imaging Under The Microscope
In dry lithography, the Numerical Aperture (NA) of the space between the lens and the resist cannot exceed one. This is because the aperture angle u is restricted to <ð/2 so that light can pass from the lens to the resist in a forward direction.
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In dry lithography, the Numerical Aperture (NA) of the space between the lens... -
The aperture angle is restricted to <ð/2 so that light can pass from the lens... -
90nm SRAM cell showing Poly layer overlaid to Active. The former was exposed... -
Major suppliers have announced roadmaps for 193nm immersion scanners covering...
