Immersion Imaging Under The Microscope
Major suppliers have announced roadmaps for 193nm immersion scanners covering NA = 0.85 to >1.2. Meanwhile, resist and track suppliers have developed immersion-compatible systems, and full-chip device fabrication is ongoing.
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In dry lithography, the Numerical Aperture (NA) of the space between the lens... -
The aperture angle is restricted to <ð/2 so that light can pass from the lens... -
90nm SRAM cell showing Poly layer overlaid to Active. The former was exposed... -
Major suppliers have announced roadmaps for 193nm immersion scanners covering...
