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Metrology, Inspection and Monitoring - Page 1

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Latest Metrology, Inspection and Monitoring Update

Optical System Looks for Defects 01 March, 2005 Conventional equipment is not capable of detecting fine defects in new materials. Dr Kenji Watanabe explains how Hitachi and Tokyo Siesmitsu have developed the DUV optical wafer inspection... > read more

Is Bist Best? 01 September, 2004 The rise of systems-on-a-chip technology is setting challenging new parameters for test equipment manufacturers and vendors. But with standardisation at zero, what is the best testing...

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