Metrology, Inspection and Monitoring
Latest Metrology, Inspection and Monitoring Feature
Conventional equipment is not capable of detecting fine defects in new materials. Dr Kenji Watanabe explains how Hitachi and Tokyo Siesmitsu have developed the DUV optical wafer inspection system for the 65nm technology node.
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Is Bist Best?
The rise of systems-on-a-chip technology is setting challenging new parameters for test equipment manufacturers and...
The rise of systems-on-a-chip technology is setting challenging new parameters for test equipment manufacturers and...
