Specifications - Crolles2 Alliance Facility Expansion, Crolles, France
| Key Data | |
|---|---|
| Organisation | STMicroelectronics, Philips and Motorola |
| Location | Crolles 2, Grenoble, France |
| Type of facility (technologies) | CMOS, embedded SRAM, DRAM, MRAM, SOI, analog/mixed signal |
| Project cost | $1.4 billion |
| Area | 5,000mē clean room |
| Target completion | Investment committed until 2007 |
| No of employees | 1,200 |
| Project Details | |
| Wafer size | 300mm |
| Feature size | 90nm to 32nm up to 2007 |
| Applications | Many including DVD players, set top boxes, personal video recorders, PC peripherals and 3G/4G mobile handsets |
| Process Details | |
| Equipment | ASM Lithography (wafer stepper), DMS Milestone III (centrifugal cleaning system), SOPRA TM SE 300 (Spectroscopic Ellipsometer), SEA ILSIMS (secondary ion mass spectrometry, Cameca IMS Wf), Philips Analytical (ellipsometer), Virage Logic Corp. |
Copyright 2007SPG Media Limited a subsidiary of SPG Media Group PLC
