IQE III-V Semiconductor Facility, Cardiff, United Kingdom
Key Data:
Organisation
IQE (Europe) Ltd
Location
Cardiff, UK
Type of facility (technologies)
Wafers for the compound semiconductor industry
Project Details:
Project cost
IQE has invested over £100 million in the Cardiff site over the last five years
Main contractor
WS Atkins (cleanroom)
Cleanroom area
10,000m²
No of employees
Around 270
Process Details:
Wafer size
2in to 6in
Substrate production
Vertical Gradient Freeze (VGF) and Czochralski growth
Materials
GaAs, AlGaAs and InGaAs, on GaAs and InP substrates, for MESFET, HEMT, PHEMT, HBT, laser, and Quantum Well Infrared Photodetectors (QWIP)
Equipment
VG's V150 multi-wafer MBE systems, MOVPE reactors from Aixtron GmBH and Riber
Applications
Wireless and satellite communication, wireless cable, Direct Broadcast Satellite (DBS) television, radar, automotive and infrared sensor
