Toshiba 300mm Wafer Fab, NAND Flash Memory Fab-4, YOKKAICHI, Japan
Key Data:
Organization
Toshiba and SanDisk
Location
Fab-4, Yokkaichi, Japan
Type of facility (technologies)
Flash memory
Project Details:
Project cost
Similar to Fab-3, which has cost around ¥200 billion (nearly US$2 billion) to the end of FY2005.
Main contractor
Not yet announced
Area
Floor area will be around 113,000m², with 34,500m² clean room.
Construction start
August 2006
Target completion
Q4 2007
No of employees
Nearly 2,000 at the site
Wafer size
300mm
Feature size
55mm
Applications
Memories for mobile products including digital still cameras and multimedia mobile phones.
