Behind the Photomask
Figure 2 – reject reasons – yield loss aggregated over all types of masks, including critical and non-critical layers, is dominated by unrepairable opaque defects.
Learn more
Hover over the logos to learn more about the companies who made this project possible.
-
Coftech
FollowMake an Enquiry
-
Camfil Farr
The Camfil Farr Group, based in Stockholm, Sweden, is a...
About
The Camfil Farr Group, based in Stockholm, Sweden, is a world leader in the development and production of air filters and clean air solutions.
FollowMake an Enquiry
-
Soitec
FollowMake an Enquiry
Behind the Photomask
Figure 2 – reject reasons – yield loss aggregated over all types of masks, including critical and non-critical layers, is dominated by unrepairable opaque defects.
Behind the Photomask
Figure 2 – reject reasons – yield loss aggregated over all types of masks, including critical and non-critical layers, is dominated by unrepairable opaque defects.
