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Immersion Imaging Under The Microscope

In dry lithography, the Numerical Aperture (NA) of the space between the lens and the resist cannot exceed one. This is because the aperture angle u is restricted to <ð/2 so that light can pass from the lens to the resist in a forward direction.



Immersion Imaging Under The Microscope

In dry lithography, the Numerical Aperture (NA) of the space between the lens and the resist cannot exceed one. This is because the aperture angle u is restricted to <ð/2 so that light can pass from the lens to the resist in a forward direction.



Immersion Imaging Under The Microscope

In dry lithography, the Numerical Aperture (NA) of the space between the lens and the resist cannot exceed one. This is because the aperture angle u is restricted to <ð/2 so that light can pass from the lens to the resist in a forward direction.



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