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Crolles2 Alliance Facility Expansion, Crolles

Organisation

STMicroelectronics, Philips and Motorola

Location

Crolles 2, Grenoble, France

Type of facility (technologies)

CMOS, embedded SRAM, DRAM, MRAM, SOI, analog/mixed signal

Project cost

$1.4 billion

Area

5,000m² clean room

Target completion

Investment committed until 2007

No of employees

1,200

Wafer size

300mm

Feature size

90nm to 32nm up to 2007

Applications

Many including DVD players, set top boxes, personal video recorders, PC peripherals and 3G/4G mobile handsets

Equipment

ASM Lithography (wafer stepper), DMS Milestone III (centrifugal cleaning system), SOPRA TM SE 300 (Spectroscopic Ellipsometer), SEA ILSIMS (secondary ion mass spectrometry, Cameca IMS Wf), Philips Analytical (ellipsometer), Virage Logic Corp.
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