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Elpida Memory

Organization

Elpida Memory, Inc. and Hiroshima Elpida Memory, Inc.

Location

Hiroshima, Japan

Type of facility (technologies)

CMOS

Project cost

Total construction cost is estimated at ¥450 billion to ¥500 billion

Area

90,870m²

Start date

10 June 2004

Completion

December 2005

Wafer size

300mm

Feature size

85nm soon after opening

Throughput

60,000 wafers/month maximum

Applications

Servers, mobile / cellular and consumer equipment, PCs, PDAs
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Project Overview



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