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IQE III-V

Organisation

IQE (Europe) Ltd

Location

Cardiff, UK

Type of facility (technologies)

Wafers for the compound semiconductor industry

Project cost

IQE has invested over £100 million in the Cardiff site over the last five years

Main contractor

WS Atkins (cleanroom)

Cleanroom area

10,000m²

No of employees

Around 270

Wafer size

2in to 6in

Substrate production

Vertical Gradient Freeze (VGF) and Czochralski growth

Materials

GaAs, AlGaAs and InGaAs, on GaAs and InP substrates, for MESFET, HEMT, PHEMT, HBT, laser, and Quantum Well Infrared Photodetectors (QWIP)

Equipment

VG's V150 multi-wafer MBE systems, MOVPE reactors from Aixtron GmBH and Riber

Applications

Wireless and satellite communication, wireless cable, Direct Broadcast Satellite (DBS) television, radar, automotive and infrared sensor
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Project Overview



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