• 4G: Challenges and Opportunities

    As 4G approaches, David Perkins identifies the many convergence challenges for next-generation wireless networking. The corporate vice-president and general manager of Freescale also outlines some potential solutions.

  • Phase Shift Masks Fuel Chip-Making Productivity

    How can phase-shifting photomasks overcome conventional light source and lens resolution limitations in chip production? Dr Franklin Kalk, executive vice-president and chief technology officer at Toppan Photomasks, describes how.

  • A New Model For Semiconductor Manufacturing

    Soaring manufacturing costs have seen the industry's major players team up to undertake design and production jointly. Jim McGregor, In-Stat, outlines the successful coming together of three industry leaders.

  • Photonic Integration: The Next Small Thing

    The quest for greater processing speed is now focusing on achieving more efficient data flow within systems. TC Chen reports on an IBM project that uses optical devices to enhance...

  • Patent Power

    Careful patenting of intellectual property is essential if your company is to protect its global interests. Peter Mikhail, Peter Gallagher and James Hsue ask "Are you IP aware?"

  • Box of Tricks

    To mark the Global Semiconductor Forum 2007, the GSF Journal talks to Bill Adamec. The senior director of the Xbox Semiconductor Technology Group at Microsoft, gives his views on some...

  • Reliability Determines Submicron Future

    Sub-100nm CMOS SOC technologies are the hub of industry activity. Their time to market depends, however, on the industry's ability to address reliability issues. Peter Rickert, director of platform technology...

  • Behind the Photomask

    Scott Hector, mask strategy programme manager, SEMATECH, on assignment from Freescale Semiconductor Inc, looks at critical issues for photomask fabrication to continue extending optical lithography.

  • Optical System Looks for Defects

    Conventional equipment is not capable of detecting fine defects in new materials. Dr Kenji Watanabe explains how Hitachi and Tokyo Siesmitsu have developed the DUV optical wafer inspection system for...