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As 4G approaches, David Perkins identifies the many convergence challenges for next-generation wireless networking. The corporate vice-president and general manager of Freescale also outlines some potential solutions.
How can phase-shifting photomasks overcome conventional light source and lens resolution limitations in chip production? Dr Franklin Kalk, executive vice-president and chief technology officer at Toppan Photomasks, describes how.
Soaring manufacturing costs have seen the industry's major players team up to undertake design and production jointly. Jim McGregor, In-Stat, outlines the successful coming together of three industry leaders.
The quest for greater processing speed is now focusing on achieving more efficient data flow within systems. TC Chen reports on an IBM project that uses optical devices to enhance...
Careful patenting of intellectual property is essential if your company is to protect its global interests. Peter Mikhail, Peter Gallagher and James Hsue ask "Are you IP aware?"
To mark the Global Semiconductor Forum 2007, the GSF Journal talks to Bill Adamec. The senior director of the Xbox Semiconductor Technology Group at Microsoft, gives his views on some...
Sub-100nm CMOS SOC technologies are the hub of industry activity. Their time to market depends, however, on the industry's ability to address reliability issues. Peter Rickert, director of platform technology...
Scott Hector, mask strategy programme manager, SEMATECH, on assignment from Freescale Semiconductor Inc, looks at critical issues for photomask fabrication to continue extending optical lithography.
EUV sources achieve higher power, but need greater collector lifetimes, writes Vivek Bakshi of SEMATECH's technical staff.
Conventional equipment is not capable of detecting fine defects in new materials. Dr Kenji Watanabe explains how Hitachi and Tokyo Siesmitsu have developed the DUV optical wafer inspection system for...
