Analysis

  • Optical System Looks for Defects

    Conventional equipment is not capable of detecting fine defects in new materials. Dr Kenji Watanabe explains how Hitachi and Tokyo Siesmitsu have developed the DUV optical wafer inspection system for...

  • Scaling the Keff Challenge

    The pressure of Moore's law has led to a potential impasse. Traditional semiconductor materials cannot scale further and the potential replacements present numerous developmental difficulties. The October 2004 SEMATECH symposium...

  • Maskless Lithography

    The growing cost of lithography masks is raising concerns for future technology generations. In response, semiconductor manufacturers are exploring maskless lithography as a possible solution. Walt Trybula, senior fellow of...

  • Bridging the Design Gap

    The cumulative trials of miniaturisation and differentiation are forcing integrated device manufacturers to reassess the production chain. René Penning de Vries of Philips Semiconductors makes the case for a resource-sharing...

  • Collaboration: A New Model Evolves

    The pressure of Moore's Law and the need to keep costs low demand a new approach to equipment development. Collaboration could be key. Barbara Levine, Alan Furlano and Jack Uppal...

  • Capital Expenditure Excesses Curbed

    The massive boom/bust that was characteristic of the previous chip cycle looks unlikely to repeat itself this time around. Len Jelinek of iSuppli reports on the market dynamics at the...

  • Beijing Beginning

    The weight of demand for domestic-produced integrated circuits is poised to push China through the 300mm transition phase. Marco Mora, chief operating officer at SMIC, illustrates the peculiarities and opportunities...

  • Is Bist Best?

    The rise of systems-on-a-chip technology is setting challenging new parameters for test equipment manufacturers and vendors. But with standardisation at zero, what is the best testing approach? Shekar Gopalan of...

  • Machine Learning in Manufacturing

    There is money to be saved from the use of even the simplest machine learning routines. Gary R Bradski of Intel Research assesses the leading algorithms and how they might...

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