Metrology, Inspection and Monitoring
| Carl Zeiss SMT | ||
The unique AIMS™ mask evaluation technology optically emulates and analyses the printability of mask patterns or defects by selecting stepper equivalent conditions concerning wavelength, numerical aperture, sigma and reduction factor. |
The new MeRiT™ MG repair tool, which has been jointly developed with Nawotec. This is the first e-beam mask repair production tool available for 193nm masks. |
The CrossBeam® tools enable precise and fast cross-sectioning and TEM preparation on any pre-selected position on wafers. |
LIBRA® TEMs are designed for atomic scale visualisation and analysis of critical structures, interfaces, films and barriers, processors and devices. |
Molecular Imprint Inc.'s S-FIL™ flash imprint technology is a simple step-and-repeat nano lithography imprint process for structures down to 2nm. This is the perfect solution for 3D, micron and sub 50nm patterning for research and small volume manufacturing. |
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